This reminds me of the latest ASML machines coordinating UV laser (angle) and diffraction grating to achieve clean small 2D patterns.
I'm curious how hard it is to model light interactions on this scale. What does it take for the authors to come up with modeling solutions for their scaling problems? Is this something one PhD in light physics could do, or do companies and people develop expertise in teams over decades?
It seems like ASML only requires the solution to one wave diffraction interaction (with the mask), but modeling the standing wave and higher-order modes would require much more mathematics. Is it even possible if the solutions for each interaction are probabilistic?
Also, are solutions in practice mostly bounded by the kinds of semiconductor features (holes) they can build?
I'm curious how hard it is to model light interactions on this scale. What does it take for the authors to come up with modeling solutions for their scaling problems? Is this something one PhD in light physics could do, or do companies and people develop expertise in teams over decades?
It seems like ASML only requires the solution to one wave diffraction interaction (with the mask), but modeling the standing wave and higher-order modes would require much more mathematics. Is it even possible if the solutions for each interaction are probabilistic?
Also, are solutions in practice mostly bounded by the kinds of semiconductor features (holes) they can build?